Only a few years ago, electron beam lithography was regarded as an expensive technique available only for military and well-funded R&D sites. Raith has pioneered the market for experimental budget-oriented e-beam systems and commercialised the first e-beam conversion kit in 1985.
With about 700 installations worldwide, nowadays Raith is the market leader for research grade electron beam lithography systems. Working with the well-trained Raith TEAM will ensure that your needs are fulfilled.
Today, electron beam lithography is a standard equipment for academic research. E-beam lithography applications can be found in solid-state physics, applied physics and semiconductor devices. Application areas cover a wide range including cryo-electric devices, opto-electronic devices, quantum structures, transport mechanism, studies of semiconductor/superconductor interfaces, microsystems techniques, optical devices..... E-beam lithography is not only used for direct write aspects, but also for the mask making process, which is an essential process step in today's semiconductor manufacturing.
Two basic configurations have been established for different application areas. For high-throughput large-scale mask-making production, the conventional production-oriented e-beam systems are used, whereas for research purposes and small-scale production the conversion of Scanning Electron Microscopes or Scanning Transmission Electron Microscopes have been found to be an effective tool.
Raith offers complete lithography systems, the RAITH150-TWO, e_LiNE, ionLiNE and RAITH50. The RAITH50 and RAITH150 represent a new and innovative generation of electron beam writers for R&D application, and closes the gap between the SEM conversions and expensive production equipment.
For more than 20 years now, Raith is well-known in the community for developing SEM/FIB nanolithography attachments such as ELPHY Quantum and ELPHY Plus for almost any SEM / FIB type. Such combined systems can be upgraded with Raith's Laser stage technology other necessary accessories making it possible to easily create your own nanolithography system.
