RAITH150-TWO
The RAITH150-TWO is the primary choice of Nano Research Centres for ultra high resolution patterning in the nanometer range and complex applications on masks and wafers up to 8 inch. A 20-MHz pattern generator using optimised pattern filling modes shortens exposure times. Stability is improved by newly designed shielding with independent temperature control
e_LiNE plus
ionLiNE
e_LiNE plus is a ultra high resolution electron beam lithography system and nano engineering workstation for universities and other academic institutions. Still, the e_LiNE plus is pushing chip- and waferscale EBL performance in the R&D tool category.
ionLiNE is a novel ion beam lithography, nano fabrication and engineering workstation for low dose applications in surface science, thin film engineering and applied physics research.
Designed in an uncompromised nanolithography system architecture, ionLiNE represents a new instrument class for research and development.
Only a few years ago, electron beam lithography was regarded as an expensive technique available only for military and well-funded R&D sites. Raith has pioneered the market for experimental budget-oriented e-beam systems and commercialised the first e-beam conversion kit in 1985.
With about 700 installations worldwide, nowadays Raith is the market leader for research grade electron beam lithography systems. Working with the well-trained Raith TEAM will ensure that your needs are fulfilled.
Today, electron beam lithography is a standard equipment for academic research. E-beam lithography applications can be found in solid-state physics, applied physics and semiconductor devices. Application areas cover a wide range including cryo-electric devices, opto-electronic devices, quantum structures, transport mechanism, studies of semiconductor/superconductor interfaces, microsystems techniques, optical devices..... E-beam lithography is not only used for direct write aspects, but also for the mask making process, which is an essential process step in today's semiconductor manufacturing.
Two basic configurations have been established for different application areas. For high-throughput large-scale mask-making production, the conventional production-oriented e-beam systems are used, whereas for research purposes and small-scale production the conversion of Scanning Electron Microscopes or Scanning Transmission Electron Microscopes have been found to be an effective tool.
Raith offers complete lithography systems, the RAITH150-TWO, e_LiNE plus, ionLiNE and PIONEER. The RAITH EBL systems represent a new and innovative generation of electron beam writers for R&D application, and closes the gap between the SEM conversions and expensive production equipment.
